Protected: Tutorial Notes
ALD & ALE 2017 Tutorial Schedule and Notes
If you have registered to attend the tutorial the notes will be available in early July. A password
will be included in your tutorial registration con�rmation letter. Please note that no printed
materials will be available onsite so please download in advance.
Saturday, July 15, 2017, 1:00 p.m.-6:00 p.m.
1:00-1:05 – Tutorial Welcome
1:05-1:50 – David Emslie (McMaster Univ.), “ALD Precursors, Precursor Design, Chemistry
and Mechanisms” (PDF)
1:50-2:35 – Adrie Mackus (Eindhoven Univ. of Technology), “Approaches, Challenges, and
Opportunities for Area-selective ALD” (PDF)
2:35-3:20 – Mato Knez (Nanogune), “Coating of Physically and Chemically Challenging
Substrates” (PDF)
3:20-3:40 – Break
3:40-4:25 – Simon Elliott (Tyndall National Institute), “What Theory Can Tell us About ALD
Mechanism” (PDF)
4:25-5:10 – Vincent Donnelly (University of Houston), “Basic Mechanisms in Plasma
Etching” (PDF)
5:10-5:55 – Geun Young Yeom (Sungkyunkwan Univ.), “Atomic Layer Etching
with Ion/Neutral Beams” (PDF)
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