EQP Operating Modes
plasmadiagnostics
gasanalysis
vacuumanalysis
surfacescience
Hiden EQP Systems High Sensitivity Mass and Energy Analysers for
Monitoring, Control and Characterisation of Ions,
Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +ve
and -ve ions.
• Mass Spectra at selected ion energies for
+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification of
radical species from parent stable molecules.
10000
9000
8000
7000
6000
5000
4000
3000
2000
1000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 15
0
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SEM:c/s
400 W plasma
metastable O2
excited state a1
∆g
no plasma
ground state O2-
X3
Σ-
g
• Electron attachment ionisation scans to identify
radical species produced in the plasma from
electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasma
diagnostic tool with combined high transmission ion
energy analyser and quadrupole mass spectrometer,
acquiring both mass spectra at specified ion energies
and ion energy distributions of selected plasma ions.
The advanced EQP ioniser provides for neutral and
radical detection, the electron attachment ionisation
feature further enhancing the detection capability for
radicals in electronegative plasma chemistries.
• High Sensitivity
Sub PPM detection of plasma ions, neutrals and
radicals.
• Ion Energy Analysis
Ion Energy distributions of plasma ions are
acquired in seconds, 100 eV and 1000 eV energy
range versions are available.
• Afterglow, Pulsed Plasma, and Laser Ablation
A standard TTL signal gating input is included for
time resolved studies.
The programmable signal gating option provides
for automatic data acquisition for defined time
slices through the plasma pulse. Gating resolution
is 100 nanoseconds.
• Positive and Negative Ion Measurement
Pre-set software modes enable automatic switching
between positive ion, negative ion and neutral
analysis modes.
• Neutral and Radical Detection
The EQP integral electron impact ioniser provides
for analysis of neutral and radical species.
• Electron Attachment Ionisation
This technique of soft ionisation offered as an
option for the analysis of electronegative species in
plasma, further enhances the analysis of neutrals
and radicals.
• Appearance Potential Spectra
The EQP ioniser features precision control of all ion
source parameters, including the facility to
accurately scan electron energy for appearance
potential spectra of selected species. The
appearance potential spectra provide direct
information to confirm the fragmentation and
excitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225
Fax: +44 (0)1925 416518
Email: info@hiden.co.uk
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Countrate,cs-1
Flux,(x106
counts-1
)
Ar
+
Cr
1+
N2
+
N
+
Cr
2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0
10
20
30
40
50
60
mass : amu
Countrate,cs-1
Flux,(x106
counts-1
)
Ar
+ Cr
1+
N2
+
N
+
Cr
2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0
10
20
30
40
50
60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.
Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in
(a) and (b). Higher mass ionic species measured by
QMS are shown in (c) and (d). The data in the left
column are taken at 3 mTorr and 500W (high density
plasma condition) while those in the right column
are taken at 5 mTorr and 300W (low density plasma
condition).
Data ref:
Ryan M. Martin, Jane P. Chang
University of California, Los Angeles, USA.
J.Vac. Sci. Technol. A 27(2)
100
2000
0
120 140 160
mass : amu
SEM:c/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210
150
1000
0
170 190 210
mass : amu
SEM:c/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
Positive Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 90 to 220 amu, showing Molybdenum Fluoride Ions.
Negative Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 140 to 220 amu, showing SF6
,
MoF5
and
MoF6
-
Ions.
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+
IED
Inductively Coupled
Plasma Source
25mT 100W
SEM:c/s
energy: VCycle number 0000001
0
0
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SEM:c/s
0
0
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
EQP Operating Modes
• Ion Energy Distributions of selected +ve
and -ve ions.
• Mass Spectra at selected ion energies for
+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification of
radical species from parent stable molecules.
10000
9000
8000
7000
6000
5000
4000
3000
2000
1000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 15
0
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SEM:c/s
400 W plasma
metastable O2
excited state a1
∆g
no plasma
ground state O2
-
X3
Σ-
g
• Electron attachment ionisation scans to identify
radical species produced in the plasma from
electronegative gases.
CF3
Ions
By Attachment in CF4
The Hiden EQP System is an advanced plasma
diagnostic tool with combined high transmission ion
energy analyser and quadrupole mass spectrometer,
acquiring both mass spectra at specified ion energies
and ion energy distributions of selected plasma ions.
The advanced EQP ioniser provides for neutral and
radical detection, the electron attachment ionisation
feature further enhancing the detection capability for
radicals in electronegative plasma chemistries.
• High Sensitivity
Sub PPM detection of plasma ions, neutrals and
radicals.
• Ion Energy Analysis
Ion Energy distributions of plasma ions are
acquired in seconds, 100 eV and 1000 eV energy
range versions are available.
• Afterglow, Pulsed Plasma, and Laser Ablation
A standard TTL signal gating input is included for
time resolved studies.
The programmable signal gating option provides
for automatic data acquisition for defined time
slices through the plasma pulse. Gating resolution
is 100 nanoseconds.
• Positive and Negative Ion Measurement
Pre-set software modes enable automatic switching
between positive ion, negative ion and neutral
analysis modes.
• Neutral and Radical Detection
The EQP integral electron impact ioniser provides
for analysis of neutral and radical species.
• Electron Attachment Ionisation
This technique of soft ionisation offered as an
option for the analysis of electronegative species in
plasma, further enhances the analysis of neutrals
and radicals.
• Appearance Potential Spectra
The EQP ioniser features precision control of all ion
source parameters, including the facility to
accurately scan electron energy for appearance
potential spectra of selected species. The
appearance potential spectra provide direct
information to confirm the fragmentation and
excitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Ar+
IED
Inductively Coupled
Plasma Source
25mT 100W
SEM:c/s
energy: VCycle number 0000001
0
0
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SEM:c/s
0
0
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
Energy Analyser
• The EQP high transmission energy analyser provides ion
energy distributions of selected ions within the plasma.
For example, the energy with which each species is
interacting with the substrate - critical information in low
damage etch.
• A 45 degree sector field energy analyser is used to provide
minimum perturbation to the ion flight path within the
analyser for optimum energy resolution.
• The EQP energy analyser provides constant transmission
and constant energy resolution functions throughout the ion
energy range (+/- 100 eV, +/-1000 eV)
• The energy resolution of the sector field energy analyser is
better than 0.25 eV FWHM.
• Energy scanning for all ions is automatically controlled with
energy increments selectable from 0.05 eV.
• The EQP system is floatable to 10 KeV using external power
supplies and isolation components.
Mass Analyser
• A triple filter mass analyser construction is included in the
EQP system. The triple mass filter has short 'RF only' pre
and post filters which minimise effects from fringe fields at
the primary mass filter ion entrance and exit. This enhances
peak separation and transmission particularly for high mass
species. This triple filter configuration has been proven
superior in performance to single filter quadrupoles in
recent years.
• Abundance sensitivity is to 0.1PPM. Detection to 20PPB is
available for non-interfering species.
• The mass filter rods are precision ground from molybdenum
with precision machined radially supporting ceramics for
high performance, durability and long term stability.
Detector
• An ion counting detector is included as standard offering
seven decades continuous dynamic range.
• Counting is via a 32 bit counter for 1c/sec resolution
throughout the range.
• A Faraday cup option extends the range up to 5 x 1010
c/s
for high density plasma applications.
• The EQP software provides for data acquisition as raw
counts, counts per second, averaged counts per second or
integrated counts. Averaging or accumulating counts over
repeated mass and energy scans significantly increases
signal to noise in the analysis of minor components.
• A TTL output of raw counts is available via a connector on
the EQP electronics system.
• A signal gating input is included as standard to provide for
time resolved plasma studies with a resolution of 100
nanoseconds suited to pulsed plasma or laser ablation
applications. The programmable signal gating option
provides for automatic data acquisition for a defined
time slice through the plasma pulse.
Plasma Sampling Interface
• A range of laser drilled orifices from 30µm diameter.
The orifice design is optimised for plasma sampling using
pre-thinned material for the laser drilled component.
• Software controlled ion extraction optics provide for plasma
sampling with minimum perturbation of the plasma.
• A standard connection is included in the EQP electronics to
allow the EQP system to be referenced to an external
supply, a plasma electrode for example. This feature
enables ion energy distributions to be referenced to the
substrate's self bias.
• Plasma electrodes coupled to the EQP provide a substrate
platform for sampling the plasma as it interacts with the
substrate during processing. Electrodes are custom
designed to suit RF, DC or pulsed plasma supplies with
heated substrate stages and water cooling options
available.
• The EQP sampling configuration can be readily user
disassembled for ioniser filament replacement and
cleaning.
Internal Ioniser
• The internal EQP ioniser includes two oxide coated iridium
filaments, with a radially symmetric cage. The assembly is
closely coupled to the plasma sampling orifice for high
sensitivity analysis of plasma gas neutrals and radicals.
• EQP software provides for precision control of the ion
source operating parameters including filament emission,
source cage voltage and the ionising electron energy.
• A key feature of the EQP ioniser design is the confinement
of electrons within the ion cage vicinity. This allows a high
degree of control for the detailed appearance potential
measurements used in the analysis of radicals.
• An electron attachment ionisation option is available
which allows for analysis of negative ions produced
in the EQP ioniser where electronegative species
are present. This technique provides valuable
information in the analysis of radical species from
electronegative plasmas.
EQP 300 – 300 AMU mass range
EQP 500 – 510 AMU mass range
EQP systems include a 6mm pole diameter triple filter quadrupole mass spectrometer.
EQP 1000 series
Available configured for mass range 50, 300, 510, 1000, 2500 AMU
EQP1000 series systems include a 9mm pole diameter triple filter quadrupole mass
spectrometer for enhanced abundance sensitivity and high mass range capability.
A 200Watt remote RF/DC power supply is included with EQP 1000 series systems.
EQP Systems are offered with a range of standard plasma sampling
options to provide a non invasive sampling interface for a broad
range of plasma applications including:
• ECR- Electron Cyclotron Resonance
• HIPIMS
• Magnetron Discharge
• Helicon Source
• DC Glow Discharge Plasma
• Pulsed Plasma & Laser Ablation
• Parallel Plate - RF Plasma
• ICP- Inductively Coupled Plasma
Plasma pressure:
up to 0.5mbar - EQP systems require differential pumping with a 60l/sec turbomolecular pump.
up to 2mbar - EQP systems require differential pumping with a 240l/sec turbomolecular pump.
> 2mbar - The EQP system is offered with the HPR 60 molecular beam sampling series
with multi stage differential pumping.
System options include:
1000 eV energy range
– 100 eV energy range is standard.
Magnetic shielding
– standard options include 500 Gauss front end shielding or 800 Gauss complete system shielding.
Water cooling
– for high density plasma applications – water cooling is required where the
temperature is expected to exceed 300˚ C.
Driven electrode
– sampling with RF or DC biased electrode - recommended for applications where direct information
about plasma interaction with the substrate under substrate bias conditions is a necessity.
Z-drive bellows sealed translator
– with gate valve to provide for sampling across the plasma volume, and for vacuum
isolation of the EQP system.
Insertion length options up to 750mm
Programmable signal gating
– recommended for pulsed plasma applications and for systems including molecular beam
sampling with chopper.
HPR-60 MBMS
– molecular beam sampling for high pressure plasma.
EQP 300 – 300 AMU mass range
EQP 500 – 510 AMU mass range
EQP systems include a 6mm pole diameter triple filter quadrupole mass spectrometer.
EQP 1000 series
Available configured for mass range 50, 300, 510, 1000, 2500 AMU
EQP1000 series systems include a 9mm pole diameter triple filter quadrupole mass
spectrometer for enhanced abundance sensitivity and high mass range capability.
A 200Watt remote RF/DC power supply is included with EQP 1000 series systems.
EQP Systems are offered with a range of standard plasma sampling
options to provide a non invasive sampling interface for a broad
range of plasma applications including:
• ECR- Electron Cyclotron Resonance
• HIPIMS
• Magnetron Discharge
• Helicon Source
• DC Glow Discharge Plasma
• Pulsed Plasma & Laser Ablation
• Parallel Plate - RF Plasma
• ICP- Inductively Coupled Plasma
Plasma pressure:
up to 0.5mbar - EQP systems require differential pumping with a 60l/sec turbomolecular pump.
up to 2mbar - EQP systems require differential pumping with a 240l/sec turbomolecular pump.
> 2mbar - The EQP system is offered with the HPR 60 molecular beam sampling series
with multi stage differential pumping.
System options include:
1000 eV energy range
– 100 eV energy range is standard.
Magnetic shielding
– standard options include 500 Gauss front end shielding or 800 Gauss complete system shielding.
Water cooling
– for high density plasma applications – water cooling is required where the
temperature is expected to exceed 300˚ C.
Driven electrode
– sampling with RF or DC biased electrode - recommended for applications where direct information
about plasma interaction with the substrate under substrate bias conditions is a necessity.
Z-drive bellows sealed translator
– with gate valve to provide for sampling across the plasma volume, and for vacuum
isolation of the EQP system.
Insertion length options up to 750mm
Programmable signal gating
– recommended for pulsed plasma applications and for systems including molecular beam
sampling with chopper.
HPR-60 MBMS
– molecular beam sampling for high pressure plasma.
Internal Ioniser Ion flight tube to provide plasma
sampling insertion from 240mm
up to 750mm
45˚ Sector field energy analyser
Turbo molecular pump port
Triple filter
quadrupole
mass analyser
Ion counting
detector
SEM:c/s
90000
70000
80000
60000
50000
40000
30000
20000
10000
0
8.5 8.7 8.9 9.1 9.3 9.5 9.7 9.9 10.1 10.3 10.5
mass : amu
FWHM 0.24ev
EQP Energy Resolution
The HIDEN EQP - The Mass/Energy Analyser for Plasma Diagnostics & Characterisation EQP Systems Configurations: EQP Systems for Plasma Applications
• Etching • Deposition • Coating • Process Development
Plasma source manufacturing
a Light Emitting Diode
Hydrogen isotope
plasma
Plasma needle - atmospheric plasma - analysis with EQP/HPR 60 molecular beam sampling system.
EQP system - in plasma - with cover tube options for SIMS - with driven electrode.
SEM:c/s
C+ at ~20PPB
100PPB
100
90
80
70
60
50
40
30
20
10
0
7 8 9 10 11 12 13 14 15 16 17
mass : amu
SEM:c/s
1.6e+08
1.4e+08
1.2e+08
1e+08
8e+07
6e+07
4e+07
2e+07
0
35 36 37 38 36 40 41 42 43 44 45
mass : amu
EQP Sensitivity
Energy Analyser
• The EQP high transmission energy analyser provides ion
energy distributions of selected ions within the plasma.
For example, the energy with which each species is
interacting with the substrate - critical information in low
damage etch.
• A 45 degree sector field energy analyser is used to provide
minimum perturbation to the ion flight path within the
analyser for optimum energy resolution.
• The EQP energy analyser provides constant transmission
and constant energy resolution functions throughout the ion
energy range (+/- 100 eV, +/-1000 eV)
• The energy resolution of the sector field energy analyser is
better than 0.25 eV FWHM.
• Energy scanning for all ions is automatically controlled with
energy increments selectable from 0.05 eV.
• The EQP system is floatable to 10 KeV using external power
supplies and isolation components.
Mass Analyser
• A triple filter mass analyser construction is included in the
EQP system. The triple mass filter has short 'RF only' pre
and post filters which minimise effects from fringe fields at
the primary mass filter ion entrance and exit. This enhances
peak separation and transmission particularly for high mass
species. This triple filter configuration has been proven
superior in performance to single filter quadrupoles in
recent years.
• Abundance sensitivity is to 0.1PPM. Detection to 20PPB is
available for non-interfering species.
• The mass filter rods are precision ground from molybdenum
with precision machined radially supporting ceramics for
high performance, durability and long term stability.
Detector
• An ion counting detector is included as standard offering
seven decades continuous dynamic range.
• Counting is via a 32 bit counter for 1c/sec resolution
throughout the range.
• A Faraday cup option extends the range up to 5 x 1010
c/s
for high density plasma applications.
• The EQP software provides for data acquisition as raw
counts, counts per second, averaged counts per second or
integrated counts. Averaging or accumulating counts over
repeated mass and energy scans significantly increases
signal to noise in the analysis of minor components.
• A TTL output of raw counts is available via a connector on
the EQP electronics system.
• A signal gating input is included as standard to provide for
time resolved plasma studies with a resolution of 100
nanoseconds suited to pulsed plasma or laser ablation
applications. The programmable signal gating option
provides for automatic data acquisition for a defined
time slice through the plasma pulse.
Plasma Sampling Interface
• A range of laser drilled orifices from 30µm diameter.
The orifice design is optimised for plasma sampling using
pre-thinned material for the laser drilled component.
• Software controlled ion extraction optics provide for plasma
sampling with minimum perturbation of the plasma.
• A standard connection is included in the EQP electronics to
allow the EQP system to be referenced to an external
supply, a plasma electrode for example. This feature
enables ion energy distributions to be referenced to the
substrate's self bias.
• Plasma electrodes coupled to the EQP provide a substrate
platform for sampling the plasma as it interacts with the
substrate during processing. Electrodes are custom
designed to suit RF, DC or pulsed plasma supplies with
heated substrate stages and water cooling options
available.
• The EQP sampling configuration can be readily user
disassembled for ioniser filament replacement and
cleaning.
Internal Ioniser
• The internal EQP ioniser includes two oxide coated iridium
filaments, with a radially symmetric cage. The assembly is
closely coupled to the plasma sampling orifice for high
sensitivity analysis of plasma gas neutrals and radicals.
• EQP software provides for precision control of the ion
source operating parameters including filament emission,
source cage voltage and the ionising electron energy.
• A key feature of the EQP ioniser design is the confinement
of electrons within the ion cage vicinity. This allows a high
degree of control for the detailed appearance potential
measurements used in the analysis of radicals.
• An electron attachment ionisation option is available
which allows for analysis of negative ions produced
in the EQP ioniser where electronegative species
are present. This technique provides valuable
information in the analysis of radical species from
electronegative plasmas.
EQP 300 – 300 AMU mass range
EQP 500 – 510 AMU mass range
EQP systems include a 6mm pole diameter triple filter quadrupole mass spectrometer.
EQP 1000 series
Available configured for mass range 50, 300, 510, 1000, 2500 AMU
EQP1000 series systems include a 9mm pole diameter triple filter quadrupole mass
spectrometer for enhanced abundance sensitivity and high mass range capability.
A 200Watt remote RF/DC power supply is included with EQP 1000 series systems.
EQP Systems are offered with a range of standard plasma sampling
options to provide a non invasive sampling interface for a broad
range of plasma applications including:
• ECR- Electron Cyclotron Resonance
• HIPIMS
• Magnetron Discharge
• Helicon Source
• DC Glow Discharge Plasma
• Pulsed Plasma & Laser Ablation
• Parallel Plate - RF Plasma
• ICP- Inductively Coupled Plasma
Plasma pressure:
up to 0.5mbar - EQP systems require differential pumping with a 60l/sec turbomolecular pump.
up to 2mbar - EQP systems require differential pumping with a 240l/sec turbomolecular pump.
> 2mbar - The EQP system is offered with the HPR 60 molecular beam sampling series
with multi stage differential pumping.
System options include:
1000 eV energy range
– 100 eV energy range is standard.
Magnetic shielding
– standard options include 500 Gauss front end shielding or 800 Gauss complete system shielding.
Water cooling
– for high density plasma applications – water cooling is required where the
temperature is expected to exceed 300˚ C.
Driven electrode
– sampling with RF or DC biased electrode - recommended for applications where direct information
about plasma interaction with the substrate under substrate bias conditions is a necessity.
Z-drive bellows sealed translator
– with gate valve to provide for sampling across the plasma volume, and for vacuum
isolation of the EQP system.
Insertion length options up to 750mm
Programmable signal gating
– recommended for pulsed plasma applications and for systems including molecular beam
sampling with chopper.
HPR-60 MBMS
– molecular beam sampling for high pressure plasma.
EQP 300 – 300 AMU mass range
EQP 500 – 510 AMU mass range
EQP systems include a 6mm pole diameter triple filter quadrupole mass spectrometer.
EQP 1000 series
Available configured for mass range 50, 300, 510, 1000, 2500 AMU
EQP1000 series systems include a 9mm pole diameter triple filter quadrupole mass
spectrometer for enhanced abundance sensitivity and high mass range capability.
A 200Watt remote RF/DC power supply is included with EQP 1000 series systems.
EQP Systems are offered with a range of standard plasma sampling
options to provide a non invasive sampling interface for a broad
range of plasma applications including:
• ECR- Electron Cyclotron Resonance
• HIPIMS
• Magnetron Discharge
• Helicon Source
• DC Glow Discharge Plasma
• Pulsed Plasma & Laser Ablation
• Parallel Plate - RF Plasma
• ICP- Inductively Coupled Plasma
Plasma pressure:
up to 0.5mbar - EQP systems require differential pumping with a 60l/sec turbomolecular pump.
up to 2mbar - EQP systems require differential pumping with a 240l/sec turbomolecular pump.
> 2mbar - The EQP system is offered with the HPR 60 molecular beam sampling series
with multi stage differential pumping.
System options include:
1000 eV energy range
– 100 eV energy range is standard.
Magnetic shielding
– standard options include 500 Gauss front end shielding or 800 Gauss complete system shielding.
Water cooling
– for high density plasma applications – water cooling is required where the
temperature is expected to exceed 300˚ C.
Driven electrode
– sampling with RF or DC biased electrode - recommended for applications where direct information
about plasma interaction with the substrate under substrate bias conditions is a necessity.
Z-drive bellows sealed translator
– with gate valve to provide for sampling across the plasma volume, and for vacuum
isolation of the EQP system.
Insertion length options up to 750mm
Programmable signal gating
– recommended for pulsed plasma applications and for systems including molecular beam
sampling with chopper.
HPR-60 MBMS
– molecular beam sampling for high pressure plasma.
Internal Ioniser Ion flight tube to provide plasma
sampling insertion from 240mm
up to 750mm
45˚ Sector field energy analyser
Turbo molecular pump port
Triple filter
quadrupole
mass analyser
Ion counting
detector
SEM:c/s
90000
70000
80000
60000
50000
40000
30000
20000
10000
0
8.5 8.7 8.9 9.1 9.3 9.5 9.7 9.9 10.1 10.3 10.5
mass : amu
FWHM 0.24ev
EQP Energy Resolution
The HIDEN EQP - The Mass/Energy Analyser for Plasma Diagnostics & Characterisation EQP Systems Configurations: EQP Systems for Plasma Applications
• Etching • Deposition • Coating • Process Development
Plasma source manufacturing
a Light Emitting Diode
Hydrogen isotope
plasma
Plasma needle - atmospheric plasma - analysis with EQP/HPR 60 molecular beam sampling system.
EQP system - in plasma - with cover tube options for SIMS - with driven electrode.
SEM:c/s
C+ at ~20PPB
100PPB
100
90
80
70
60
50
40
30
20
10
0
7 8 9 10 11 12 13 14 15 16 17
mass : amu
SEM:c/s
1.6e+08
1.4e+08
1.2e+08
1e+08
8e+07
6e+07
4e+07
2e+07
0
35 36 37 38 36 40 41 42 43 44 45
mass : amu
EQP Sensitivity
EQP Operating Modes
plasmadiagnostics
gasanalysis
vacuumanalysis
surfacescience
Hiden EQP Systems High Sensitivity Mass and Energy Analysers for
Monitoring, Control and Characterisation of Ions,
Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +ve
and -ve ions.
• Mass Spectra at selected ion energies for
+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification of
radical species from parent stable molecules.
10000
9000
8000
7000
6000
5000
4000
3000
2000
1000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 15
0
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SEM:c/s
400 W plasma
metastable O2
excited state a1
∆g
no plasma
ground state O2-
X3
Σ-
g
• Electron attachment ionisation scans to identify
radical species produced in the plasma from
electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasma
diagnostic tool with combined high transmission ion
energy analyser and quadrupole mass spectrometer,
acquiring both mass spectra at specified ion energies
and ion energy distributions of selected plasma ions.
The advanced EQP ioniser provides for neutral and
radical detection, the electron attachment ionisation
feature further enhancing the detection capability for
radicals in electronegative plasma chemistries.
• High Sensitivity
Sub PPM detection of plasma ions, neutrals and
radicals.
• Ion Energy Analysis
Ion Energy distributions of plasma ions are
acquired in seconds, 100 eV and 1000 eV energy
range versions are available.
• Afterglow, Pulsed Plasma, and Laser Ablation
A standard TTL signal gating input is included for
time resolved studies.
The programmable signal gating option provides
for automatic data acquisition for defined time
slices through the plasma pulse. Gating resolution
is 100 nanoseconds.
• Positive and Negative Ion Measurement
Pre-set software modes enable automatic switching
between positive ion, negative ion and neutral
analysis modes.
• Neutral and Radical Detection
The EQP integral electron impact ioniser provides
for analysis of neutral and radical species.
• Electron Attachment Ionisation
This technique of soft ionisation offered as an
option for the analysis of electronegative species in
plasma, further enhances the analysis of neutrals
and radicals.
• Appearance Potential Spectra
The EQP ioniser features precision control of all ion
source parameters, including the facility to
accurately scan electron energy for appearance
potential spectra of selected species. The
appearance potential spectra provide direct
information to confirm the fragmentation and
excitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225
Fax: +44 (0)1925 416518
Email: info@hiden.co.uk
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Countrate,cs-1
Flux,(x106
counts-1
)
Ar
+
Cr
1+
N2
+
N
+
Cr
2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0
10
20
30
40
50
60
mass : amu
Countrate,cs-1
Flux,(x106
counts-1
)
Ar
+ Cr
1+
N2
+
N
+
Cr
2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0
10
20
30
40
50
60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.
Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in
(a) and (b). Higher mass ionic species measured by
QMS are shown in (c) and (d). The data in the left
column are taken at 3 mTorr and 500W (high density
plasma condition) while those in the right column
are taken at 5 mTorr and 300W (low density plasma
condition).
Data ref:
Ryan M. Martin, Jane P. Chang
University of California, Los Angeles, USA.
J.Vac. Sci. Technol. A 27(2)
100
2000
0
120 140 160
mass : amu
SEM:c/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210
150
1000
0
170 190 210
mass : amu
SEM:c/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
Positive Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 90 to 220 amu, showing Molybdenum Fluoride Ions.
Negative Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 140 to 220 amu, showing SF6
,
MoF5
and
MoF6
-
Ions.
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+
IED
Inductively Coupled
Plasma Source
25mT 100W
SEM:c/s
energy: VCycle number 0000001
0
0
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SEM:c/s
0
0
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140
EQP Operating Modes
plasmadiagnostics
gasanalysis
vacuumanalysis
surfacescience
Hiden EQP Systems High Sensitivity Mass and Energy Analysers for
Monitoring, Control and Characterisation of Ions,
Neutrals and Radicals in Plasma.
• Ion Energy Distributions of selected +ve
and -ve ions.
• Mass Spectra at selected ion energies for
+ve ions, -ve ions and neutrals.
• Appearance potential spectra for identification of
radical species from parent stable molecules.
10000
9000
8000
7000
6000
5000
4000
3000
2000
1000
10 10.5 11 11.5 12 12.5 13 13.5 14 14.5 15
0
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
electron-energy: V
SEM:c/s
400 W plasma
metastable O2
excited state a1
∆g
no plasma
ground state O2-
X3
Σ-
g
• Electron attachment ionisation scans to identify
radical species produced in the plasma from
electronegative gases.
CF4- Ions By Attachment in CF4
The Hiden EQP System is an advanced plasma
diagnostic tool with combined high transmission ion
energy analyser and quadrupole mass spectrometer,
acquiring both mass spectra at specified ion energies
and ion energy distributions of selected plasma ions.
The advanced EQP ioniser provides for neutral and
radical detection, the electron attachment ionisation
feature further enhancing the detection capability for
radicals in electronegative plasma chemistries.
• High Sensitivity
Sub PPM detection of plasma ions, neutrals and
radicals.
• Ion Energy Analysis
Ion Energy distributions of plasma ions are
acquired in seconds, 100 eV and 1000 eV energy
range versions are available.
• Afterglow, Pulsed Plasma, and Laser Ablation
A standard TTL signal gating input is included for
time resolved studies.
The programmable signal gating option provides
for automatic data acquisition for defined time
slices through the plasma pulse. Gating resolution
is 100 nanoseconds.
• Positive and Negative Ion Measurement
Pre-set software modes enable automatic switching
between positive ion, negative ion and neutral
analysis modes.
• Neutral and Radical Detection
The EQP integral electron impact ioniser provides
for analysis of neutral and radical species.
• Electron Attachment Ionisation
This technique of soft ionisation offered as an
option for the analysis of electronegative species in
plasma, further enhances the analysis of neutrals
and radicals.
• Appearance Potential Spectra
The EQP ioniser features precision control of all ion
source parameters, including the facility to
accurately scan electron energy for appearance
potential spectra of selected species. The
appearance potential spectra provide direct
information to confirm the fragmentation and
excitation state of plasma neutral species.
Hiden EQP Plasma Diagnostic Systems
Manufactured in England by:
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON, WA5 7UN, ENGLAND
Tel: +44 (0)1925 445225
Fax: +44 (0)1925 416518
Email: info@hiden.co.uk
Web Site: www.HidenAnalytical.com
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
TECHNICAL DATA SHEET 172
Certificate No. 6738
EXAMPLE EQP DATA
Countrate,cs-1
Flux,(x106
counts-1
)
Ar
+
Cr
1+
N2
+
N
+
Cr
2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
3
1
2
10
10
1k
10k
100k
1M
10M
0
0
10
20
30
40
50
60
mass : amu
Countrate,cs-1
Flux,(x106
counts-1
)
Ar
+ Cr
1+
N2
+
N
+
Cr
2+
E = 0.5 eV
Energy, (eV)
Cr(1+)
Ar(1+)
N2(1+)
0 5 10
2
1
10
10
1k
10k
100k
1M
10M
0
0
10
20
30
40
50
60
mass : amu
HIPIMS and conventional sputtering compared – mass and energy spectra
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.
Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
(a) (b)
Plasma etching of Hf-based high k thin films
QMS-measured plasma ionic species are shown in
(a) and (b). Higher mass ionic species measured by
QMS are shown in (c) and (d). The data in the left
column are taken at 3 mTorr and 500W (high density
plasma condition) while those in the right column
are taken at 5 mTorr and 300W (low density plasma
condition).
Data ref:
Ryan M. Martin, Jane P. Chang
University of California, Los Angeles, USA.
J.Vac. Sci. Technol. A 27(2)
100
2000
0
120 140 160
mass : amu
SEM:c/s
180 200 22090
4000
6000
8000
10000
12000
14000
16000
110 130 150 170 190 210
150
1000
0
170 190 210
mass : amu
SEM:c/s
140
2000
3000
4000
5000
6000
7000
8000
160 180 200 220
Magnetron sputtering – Positive and negative ion mass spectra
Positive Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 90 to 220 amu, showing Molybdenum Fluoride Ions.
Negative Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 140 to 220 amu, showing SF6
,
MoF5
and
MoF6
-
Ions.
3 mTorr, 500Watt 5 mTorr, 300Watt
Ar+
IED
Inductively Coupled
Plasma Source
25mT 100W
SEM:c/s
energy: VCycle number 0000001
0
0
500000
1e+06
1.5e+06
2e+06
2.5e+06
3e+06
3.5e+06
10 20 30 40 50 60 70 80 90 100
SEM:c/s
0
0
10000
20000
30000
40000
50000
60000
70000
80000
90000
100000
20 40 60 80 100 120 140