Obsah obrázku text, Písmo, snímek obrazovky, řada/pruh Popis byl vytvořen automaticky 7. TEA FB242 Gas discharges: physical mechanisms and applications Lasers are the dream weapon for the military. You can fire them from incredible distances with pinpoint accuracy and have the potential to be a game-changer in any battle. Advanced lasers could be used to detonate RPGs or missiles before they get to the target, they can punch through walls, and could potentially blow up ICBMs before they get too far off the ground (Reagan’s infamous Star Wars plan). There’s no ammunition concerns, just power, and despite being totally un-serviceable in the field, the lack of moving parts makes the possibility of breaking very slim Why is the military laser-crazy? The Canadian Association of Physicists (CAP) is pleased to announce that the 2008 CAP Medal-INO of Outstanding Achievement in Applied Photonics is being awarded to Dr. Jacques Beaulieu, for the invention of the transversely-excited atmospheric carbon dioxide laser as well as his work in system performance modeling. A leading physicist and researcher, Dr. Jacques Beaulieu has had a decisive influence on Canadian laser history with the development of a brand new type of high power gas laser called the CO2-TEA laser which stands for Transverse Excitation at Atmospheric pressure laser. In the late 1960s, there was intense competition with teams in Europe and the US striving to increase the operating pressure of pulsed CO2 lasers to produce a compact, efficient high power laser source for applications such as ranging and material processing. Dr. Beaulieu developed a solution that was both elegant in its simplicity and far reaching in its impact. Nine patents were eventually filed on various aspects of the new laser. Dr Beaulieu came up with a new concept of using a double discharge, the first discharge leading to pre-ionization of the gas and the second discharge leading to pumping the population inversion. The main benefits from that laser were its operation at atmospheric pressure leading to broadening of absorption lines and large energy density storage allowing faster amplification of the signal. This in turn led to its gain-switch operation on a submicrosecond time scale. This low cost table-top mega-watt peak power pulsed laser was recognized around the globe as a technological revolution for laser processing as well as for plasma generation and studies. Obrázok, na ktorom je text Automaticky generovaný popis Low pressure – „logitudial“ Townsend mechanism High pressure – „transversal“ streamer mechanism Obrázok, na ktorom je text Automaticky generovaný popis PREIONIZATION Streamer formation from a single or several separated avalanches : Calculation of streamer development in MPGDs in an axisymmetric ... The homogeneous formation of pulsed multi-avalanche uniform discharges due to the preionization Jeffrey I. Levatter and Shao‐Chi Lin: Journal of Applied Physics 51, 210 (1980) Technical solution: Preionization using an auxiliary discharge: Preionization by gamma-rays: Instability of the multiavalanche discharge plasma – generation of the cathode spots 2D- computer simulations : M.Cernak, D. Bessieres,and J. Paillol: J. Appl. Physi. 110 (2011)1063 • •(a)-(c) Electric field and (d)-(e) el. density at 27, 28, and 29 ns • Surprisingy many similarities with the positive streamer ! Stabilization by fast flowing gas Stabilization by balast resistors: https://www.youtube.com/watch?v=v9sKqGC3t-0 https://hackaday.com/2015/07/08/legit-hack-creates-tea-laser-power-by-mr-wimshurst/ https://www.hellenicaworld.com/Science/Physics/en/Excimerlaser.html „The most widespread industrial application of excimer lasers has been in deep-ultraviolet photolithography,[18][20] a critical technology used in the manufacturing of microelectronic devices (i.e., semiconductor integrated circuits or "chips"). Historically, from the early 1960s through the mid-1980s, mercury-xenon lamps had been used in lithography for their spectral lines at 436, 405 and 365 nm wavelengths. However, with the semiconductor industry's need for both higher resolution (to produce denser and faster chips) and higher throughput (for lower costs), the lamp-based lithography tools were no longer able to meet the industry's requirements. This challenge was overcome when in a pioneering development in 1982, deep-UV excimer laser lithography was proposed and demonstrated at IBM by Kanti Jain.[18][19][20][23] With phenomenal advances made in equipment technology in the last two decades, and today microelectronic devices fabricated using excimer laser lithography totaling $400 billion in annual production, it is the semiconductor industry view[22] that excimer laser lithography has been a crucial factor in the continued advance of Moore's law, enabling minimum features sizes in chip manufacturing to shrink from 800 nanometers in 1990 to 7 nanometers in 2018.[24][25] From an even broader scientific and technological perspective, since the invention of the laser in 1960, the development of excimer laser lithography has been highlighted as one of the major milestones in the 50-year history of the laser.[26][27][28]“