PřF:F6390 Solid state physics laboratory - Course Information
F6390 Solid state physics laboratory
Faculty of ScienceSpring 2019
- Extent and Intensity
- 0/3/0. 5 credit(s) (plus extra credits for completion). Type of Completion: z (credit).
- Teacher(s)
- RNDr. Luděk Bočánek, CSc. (seminar tutor)
doc. Mgr. Ondřej Caha, Ph.D. (seminar tutor)
doc. RNDr. Jan Celý, CSc. (seminar tutor)
doc. RNDr. Petr Mikulík, Ph.D. (seminar tutor)
Mgr. Jiří Novák, Ph.D. (seminar tutor)
Mgr. Mojmír Meduňa, Ph.D. (alternate examiner) - Guaranteed by
- prof. RNDr. Josef Humlíček, CSc.
Department of Condensed Matter Physics – Physics Section – Faculty of Science
Contact Person: doc. Mgr. Ondřej Caha, Ph.D.
Supplier department: Department of Condensed Matter Physics – Physics Section – Faculty of Science - Timetable
- Mon 18. 2. to Fri 17. 5. Thu 13:00–15:50 Fpk,04013
- Prerequisites (in Czech)
- F2180 Physical laboratory 1 && F3240 Physical laboratory 2 && F4210 Physical laboratory 3
- Course Enrolment Limitations
- The course is also offered to the students of the fields other than those the course is directly associated with.
- fields of study / plans the course is directly associated with
- Course objectives
- The course introduces the students into basic experimental methods in solid state physics (texts for individual tasks are on the lecture web site). Mainly methods of x-ray diffraction and reflection, optical reflectometry and ellipsometry, electron microscopy, Hall effect and work in clean rooms are studied.
- Learning outcomes
- The main objective of the course is to provide the students with the ability to
- list and describe selected fundamental experimental techniques in condensed matter physics
- individually apply these techniques during measurement of important solid state quantities. - Syllabus
- List of tasks:
A. Analysis of thin metallic layer: thickness measurement by x-ray reflectometry, Hall effect, optical response by ellipsometry.
B. Analysis of powder sample: crystalline structure using x-ray diffraction and chemical composition using x-ray fluorescence.
C. Analysis of silicon oxide layer: ellipsometry and optical reflectivity.
D. Analysis of silicon sample: optical reflectivity and orientation of monocrystal using x-ray diffraction
E. Surface studies using SEM.
F. Temperature dependence of superconductor electrical conductivity.
G. Microelectronics in a clean room and principles of photolithography.
- List of tasks:
- Literature
- Teaching methods
- Laboratory practice
- Assessment methods
- Course attendance is mandatory. Student has to present 7 tested protocols. Overall classification is determined by the grades of individual protocols. Oral testing of protocols is by the agreement with the lecturer of appropriate task.
- Language of instruction
- Czech
- Further comments (probably available only in Czech)
- Study Materials
The course is taught annually. - Teacher's information
- http://www.physics.muni.cz/kfpf/Vyuka/
- Enrolment Statistics (Spring 2019, recent)
- Permalink: https://is.muni.cz/course/sci/spring2019/F6390