PřF:FB100 Plasma chemical processes - Course Information

FB100 Plasma chemical processes

Extent and Intensity

2/0. 2 credit(s). Type of Completion: z (credit).

Teacher(s)

prof. RNDr. Mirko Černák, CSc. (lecturer)
prof. RNDr. Jan Janča, DrSc. (lecturer)

Guaranteed by

prof. RNDr. Jan Janča, DrSc.
Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Contact Person: prof. RNDr. Jan Janča, DrSc.
Supplier department: Department of Plasma Physics and Technology – Physics Section – Faculty of Science

Timetable

Tue 15:00–16:50 Fs2 6/4003

Prerequisites

F5170 Plasma physics && F7241 Plasma physics 1
F5170 Plasma Physics

Course Enrolment Limitations

The course is offered to students of any study field.

Course objectives

The goal of this subject is an understanding of selected topics from plasma chemistry with special attention to the techniques important in iindustry.
The main items are as follows:
Rate of plasma chemical reaction.
Different kinds of plasma chemical reactions.
Homogeneous and heterogeneous plasma chemical reactions.
Plasma chemical reactors.
Power supply and matching networks of plasma chemical reactors.
Plasma surface treatment of solid materials.
Plasma polymerization.
Deposition of thin films.
Plasma sputtering and plasma spraying.
Deposition of hard and supra hard coatings.
Mebranes and semipermeable thin films.
Plasma ashing and plasma etching.
Plasma chemical processes in semiconductor industry.
Plasma in modern lighting techniques.
Plasma metallurgy.

Syllabus

• Rate of plasma chemical reaction.
• Different kinds of plasma chemical reactions.
• Homogeneous and heterogeneous plasma chemical reactions.
• Plasma chemical reactors.
• Power supply and matching networks of plasma chemical reactors.
• Plasma surface treatment of solid materials.
• Plasma polymerization.
• Deposition of thin films.
• Plasma sputtering and plasma spraying.
• Deposition of hard and supra hard coatings.
• Mebranes and semipermeable thin films.
• Plasma ashing and plasma etching.
• Plasma chemical processes in semiconductor industry.
• Plasma in modern lighting techniques.
• Plasma metallurgy.

Literature

• FRIDMAN, Aleksandr Arkad'jevič. Plasma chemistry. 1st pub. Cambridge: Cambridge University Press, 2008, xlii, 978. ISBN 9781107684935. info
• SMIRNOV, Boris Michajlovič. Plasma processes and plasma kinetics : 586 worked out problems for science and technology. Weinheim: WILEY-VCH Verlag GmbH & Co. KGaA, 2007, ix, 572. ISBN 9783527406814. info
• FRIDMAN, Aleksandr Arkad'jevič and Lawrence A. KENNEDY. Plasma physics and engineering. New York: Taylor & Francis, 2004, 853 s. ISBN 1560328487. info
• Techniques and applications of plasma chemistry. Edited by John R. Hollahan - Alexis T. Bell. New York: John Wiley & Sons, 1974, viii, 403. ISBN 0471406287. info
• MCTAGGART, Frederick Kenneth. Plasma chemistry in electrical discharges. Amsterdam: Elsevier Publishing Company, 1967, xi, 246. info

Teaching methods

Theoretical oral lecture summarizing advanced appliedplasma chemical processes.

Assessment methods

Lectures. Colloquium with written test.

Language of instruction

English

Further comments (probably available only in Czech)

Information on completion of the course: Způsob ukončení je dán individuálním studijním plánem
The course can also be completed outside the examination period.
The course is taught annually.

• Enrolment Statistics (Autumn 2012, recent)
  
• Permalink: https://is.muni.cz/course/sci/autumn2012/FB100