F8120 Optics of thin films

Faculty of Science
Spring 2025
Extent and Intensity
2/1/0. 3 credit(s). Type of Completion: k (colloquium).
In-person direct teaching
Teacher(s)
prof. RNDr. Ivan Ohlídal, DrSc. (lecturer)
Mgr. Daniel Franta, Ph.D. (seminar tutor)
Mgr. Jiří Vohánka, Ph.D. (seminar tutor)
Guaranteed by
prof. RNDr. Ivan Ohlídal, DrSc.
Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Contact Person: prof. RNDr. Ivan Ohlídal, DrSc.
Supplier department: Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Prerequisites
It is necessary to pass out the subect Vibrations, waves, optics.
Course Enrolment Limitations
The course is offered to students of any study field.
Course objectives
Optics of thin films belongs to the important branches of physics of thin films. Results achieved in optics of thin films are applied in basic research and practice. The main aims of this course are as follows:
1) Explanation of principles of optics of thin films on the basis of theory of electromagnetic field.
2) Application of these principles for formulations of equations for measurable optical quantities, i.e. reflectance, transmittance and ellipsometric quantities, describing thin film systems corresponding to the systems without any defects.
3) Application of these equations for the optical analysis of thin films systems corresponding to the ideal model without defects, i.e. presentation of the most employed methods allowing to determine the values of the optical parameters characterizing the system occuring in practice frequently.
4) Use of the theoretical formulae for the optical quantities within the optical synthesis of the thin film systems, i.e. explanation of the methods enabling us to plan and propose the thin film systems with required optical quantities.
5) Explanation of the influence of defects on the optical properties of thin film systems on the basis of the electromagnetic theory, i.e. explanation of theoretical methods for including mainly roughness, transition interlayers, volume inhomogenities and area non-uniformity into equations for the optical quantities of various multilayer systems.
6) Discussion of the influence the defects on the optical analysis and synthesis of thin film systems, i.e. explanation of theoretical approaches allowing to take into account the influence of the defects within both the branches of optics of thin films.
7) Presentation of the use of the methods of optics of thin films in practice, i.e. presentation of employing the pieces of knowledge discussed in the course within applied research,optics industry, optoelectronics, semiconductor industry etc.
The students passing this course obtain knowledge enabling them to perform the optical analysis and synthesis on the standard level required in many institutions of basic and applied researches and many industrial companies. On the basis of the pieces of knowledge obtained in the course they can proceed in special studies of problems of thin films optics. In this way they can behave experts in this important field of physics.
Learning outcomes
The students will be able to
1) Explain the principles of optics of thin films on the basis of theory of electromagnetic field.
2) Apply these principles for formulations of equations for measurable optical quantities, i.e. reflectance, transmittance and ellipsometric quantities, describing thin film systems corresponding to the systems without any defects.
3) Apply these equations for the optical analysis of thin films systems corresponding to the ideal model without defects, i.e. presentation of the most employed methods allowing to determine the values of the optical parameters characterizing the system occuring in practice frequently.
4) Use the theoretical formulae for the optical quantities within the optical synthesis of the thin film systems, i.e. explanation of the methods enabling us to plan and propose the thin film systems with required optical quantities.
5) Explain the influence of defects on the optical properties of thin film systems on the basis of the electromagnetic theory, i.e. explanation of theoretical methods for including mainly roughness, transition interlayers, volume inhomogenities and area non-uniformity into equations for the optical quantities of various multilayer systems.
6) Discuss the influence the defects on the optical analysis and synthesis of thin film systems, i.e. explanation of theoretical approaches allowing to take into account the influence of the defects within both the branches of optics of thin films.
7) Present the use of the methods of optics of thin films in practice, i.e. presentation of employing the pieces of knowledge discussed in the course within applied research,optics industry, optoelectronics, semiconductor industry etc.
Syllabus
  • 1) Mathematical (ideal) model of multilayer systems suitable for formulating the theory within the classical (phenomenological) approach.
  • 2) Derivation of the formulae for the optical quantities of the multilayer systems using the model based on multiple-beam interference of light inside the thin films forming these systems.
  • 3) Derivation of the formulae for the optical quantities of the multilayer systems using the matrix approach.
  • 4) Examples of calculating both the spectral and angular dependences of the reflectances and transmittances of the multilayer systems employed in practice.
  • 5) Methods of the optical analysis of the multilayer systems allowing to determine the values of the optical parameters characterizing these systems. Illustration of these methods for the optical analysis of selected thin film systems.
  • 6) Methods of the optical synthesis of the multilayer systems. Examples of concrete procedures for selected systems (antireflection coatings, transmission monochromatic filters, laser mirrors etc.)
  • 7) Influence of some defects on the values of the optical quantities of the thin films, i.e. influence of boundary roughness, influence of columnar structure, influence of the transition interlayers and influence of non-uniformity.
  • 8) Influence of these defects on procedures employed in the optical synthesis of thin films.
  • 9) Applications of the methods of optics of thin films in applied research, optics industry, optoelectronics and semiconductor industry.
  • 10) Planar optics (propagation of light inside thin films forming waveguides).
Literature
  • Z. Knittl, Optics of thin films, John Wiley and Sons, Ltd, London, 1976
  • L. Ward, The Optical Constants of Bulk Materials and Films, IOP Publishing, Ltd, Bristol and Philadelphia, 1994
  • A. Vašíček, Optika tenkých vrstev, NČSAV, Praha, 1956
Teaching methods
Lecture.
Assessment methods
The course will be finished by a credit.
Language of instruction
Czech
Further comments (probably available only in Czech)
The course is taught once in two years.
The course is taught: every week.
General note: S.
The course is also listed under the following terms Spring 2011 - only for the accreditation, Spring 2001, Spring 2003, Spring 2005, Spring 2007, Spring 2009, Spring 2011, spring 2012 - acreditation, Spring 2013, Spring 2015, Spring 2017, Spring 2019, Spring 2021, Spring 2023.
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