F4280 Thin Films Deposition and Surface Modification Technologies

Faculty of Science
spring 2012 - acreditation

The information about the term spring 2012 - acreditation is not made public

Extent and Intensity
2/1/0. 3 credit(s) (plus extra credits for completion). Type of Completion: k (colloquium).
Teacher(s)
prof. Mgr. Petr Vašina, Ph.D. (lecturer)
doc. Mgr. Lenka Zajíčková, Ph.D. (lecturer)
Guaranteed by
prof. RNDr. David Trunec, CSc.
Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Contact Person: prof. Mgr. Petr Vašina, Ph.D.
Supplier department: Department of Plasma Physics and Technology – Physics Section – Faculty of Science
Course Enrolment Limitations
The course is also offered to the students of the fields other than those the course is directly associated with.
fields of study / plans the course is directly associated with
there are 13 fields of study the course is directly associated with, display
Course objectives
The course should provide the basic overview of all important methods used to deposit new materials in form of thin films and about methods to modify the surfaces. The student gets awared about principles and technologies of vacuum evaporation, sputtering methods, etching and surface modification as well as chemical vapour deposition or plasma enhanced chemical vapour deposition. Additionaly some of the processes will be shown in real work.
Syllabus
  • Overview of thin film deposition procedures
  • Evaporation
  • Molecular epitaxy
  • Chemical vapour depositon
  • Plasma enhanced chemical vapour depositon
  • Physical vapour deposition
  • Magnetron sputtering
  • Reactive magnetron sputtering
Literature
  • D. Depla et al Reactive sputter depositon, Springer Series in Material Science 109 2008
Teaching methods
The course is based on lectures that provide a detailed overview of the subject. The block of two laboratory exercises is organized at the end of semester. In the frame of this laboratories the students will train two methods of thin film deposition, plasma enhanced chemical vapor deposition and magnetron sputtering.
Assessment methods
individual talk
Language of instruction
English
Further Comments
The course is taught annually.
The course is taught: every week.
The course is also listed under the following terms Spring 2011 - only for the accreditation, Spring 2009, Spring 2010, Spring 2011, Spring 2012, Spring 2013, Spring 2014, Spring 2015, Spring 2016, Spring 2017, spring 2018, Spring 2019, Spring 2020, Spring 2021, Spring 2022, Spring 2023, Spring 2024, Spring 2025.