PřF:F6390 Solid state physics laboratory - Course Information
F6390 Solid state physics laboratory
Faculty of ScienceSpring 2012
- Extent and Intensity
- 0/3/0. 5 credit(s) (plus extra credits for completion). Type of Completion: graded credit.
- Teacher(s)
- RNDr. Luděk Bočánek, CSc. (seminar tutor)
doc. Mgr. Ondřej Caha, Ph.D. (seminar tutor)
doc. RNDr. Jan Celý, CSc. (seminar tutor)
doc. Mgr. Karel Kubíček, PhD. (seminar tutor)
doc. RNDr. Petr Mikulík, Ph.D. (seminar tutor)
Mgr. Mojmír Meduňa, Ph.D. (alternate examiner) - Guaranteed by
- prof. RNDr. Josef Humlíček, CSc.
Department of Condensed Matter Physics – Physics Section – Faculty of Science
Supplier department: Department of Condensed Matter Physics – Physics Section – Faculty of Science - Timetable
- Tue 9:00–11:50 Fpk,04013
- Prerequisites (in Czech)
- F2180 Physical laboratory 1 && F3240 Physical laboratory 2 && F4210 Physical laboratory 3
- Course Enrolment Limitations
- The course is also offered to the students of the fields other than those the course is directly associated with.
- fields of study / plans the course is directly associated with
- Course objectives
- The course introduces the students into basic experimental methods in solid state physics (texts for individual tasks are on the lecture web site).
Mainly methods of x-ray diffraction and reflection, optical reflectometry and elipsometry, atomic force microscopy, Hall effect and work in clean rooms are studied.
The main objective of the course is to provide the students with the ability to
- list and describe selected fundamental experimental techiques in condensed matter physics
- individually apply these techniques during measurement of important solid state quantities. - Syllabus
- List of tasks: 1. Emission and absorption x-ray spectrum. 2. Orientation of monocrystal surface. 3. Monocrystal orientation using Laue method. 4. Powder diffractometry of cubic material. 5. X-ray reflectometry measurement of thin layer thickness. 6. Surface studies usin AFM. 7. Refractive index and thickness of thin layer using elipsometry. 8. Optical reflectivity of silicon. 9. Hall effect in metal and semiconductor. 10.Microelectronics in a clean room and principles of photolithography.
- Literature
- Teaching methods
- Laboratory practice
- Assessment methods
- Course attendace is mandatory. Student has to present 10 tested protocols. Overall classification is determined by the grades of individual protocols. Oral testing of protocols is by the agreement with the lecturer of appropriate task.
- Language of instruction
- Czech
- Further Comments
- Study Materials
The course is taught annually. - Teacher's information
- http://www.physics.muni.cz/kfpf/Vyuka/
- Enrolment Statistics (Spring 2012, recent)
- Permalink: https://is.muni.cz/course/sci/spring2012/F6390